JPH0648854Y2 - ホットプレ−ト - Google Patents

ホットプレ−ト

Info

Publication number
JPH0648854Y2
JPH0648854Y2 JP657585U JP657585U JPH0648854Y2 JP H0648854 Y2 JPH0648854 Y2 JP H0648854Y2 JP 657585 U JP657585 U JP 657585U JP 657585 U JP657585 U JP 657585U JP H0648854 Y2 JPH0648854 Y2 JP H0648854Y2
Authority
JP
Japan
Prior art keywords
hot plate
vertical hole
semiconductor wafer
hole
bar
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP657585U
Other languages
English (en)
Japanese (ja)
Other versions
JPS61123541U (en]
Inventor
晃 植原
宏仁 佐合
宗雄 中山
光朗 湊
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Ohka Kogyo Co Ltd
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Priority to JP657585U priority Critical patent/JPH0648854Y2/ja
Publication of JPS61123541U publication Critical patent/JPS61123541U/ja
Application granted granted Critical
Publication of JPH0648854Y2 publication Critical patent/JPH0648854Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Formation Of Insulating Films (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
JP657585U 1985-01-21 1985-01-21 ホットプレ−ト Expired - Lifetime JPH0648854Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP657585U JPH0648854Y2 (ja) 1985-01-21 1985-01-21 ホットプレ−ト

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP657585U JPH0648854Y2 (ja) 1985-01-21 1985-01-21 ホットプレ−ト

Publications (2)

Publication Number Publication Date
JPS61123541U JPS61123541U (en]) 1986-08-04
JPH0648854Y2 true JPH0648854Y2 (ja) 1994-12-12

Family

ID=30484143

Family Applications (1)

Application Number Title Priority Date Filing Date
JP657585U Expired - Lifetime JPH0648854Y2 (ja) 1985-01-21 1985-01-21 ホットプレ−ト

Country Status (1)

Country Link
JP (1) JPH0648854Y2 (en])

Also Published As

Publication number Publication date
JPS61123541U (en]) 1986-08-04

Similar Documents

Publication Publication Date Title
JP3153372B2 (ja) 基板処理装置
JP2002520833A (ja) 多位置ロードロックチャンバー
JP2991110B2 (ja) 基板吸着保持装置
JPH0648854Y2 (ja) ホットプレ−ト
JPH11297789A (ja) 処理装置
JPS5856260B2 (ja) 移動する物品を選択的に停止させる装置
JP4531661B2 (ja) 基板の処理方法及び基板の処理装置
JPH11163102A (ja) 半導体製造装置用サセプタ
JPH11330212A (ja) 基板冷却装置および基板冷却方法
TW201946205A (zh) 基板載置裝置及基板載置方法
JP2601180Y2 (ja) 基板保持装置
CN114660898A (zh) 一种自动化光刻烘烤一体机
JPH11329925A (ja) 基板熱処理装置および基板熱処理方法
KR101261291B1 (ko) 대면적 기판의 포토레지스트 건조장치
JP2004079677A (ja) 熱処理装置
CN113948437B (zh) 自动晶圆定位总成
JPH0679140U (ja) 基板熱処理装置
JP2720163B2 (ja) イオン注入装置
JP2856001B2 (ja) 基板搬送方法
KR100791679B1 (ko) 레티클 정렬 스테이지
JP3489776B2 (ja) 熱処理装置
KR20020011625A (ko) 진공 버퍼 챔버를 구비한 핫플레이트 장치
JPH0582728B2 (en])
JPH04116845A (ja) ウェーハ保持装置及びその保持方法
JPH02295834A (ja) ウェーハ取り扱い装置